| abstract |
(57) [Problem] To provide a resist composition having excellent storage stability and giving a reverse tapered pattern. SOLUTION: This resist composition contains an alkali-soluble resin, a compound capable of generating an acid upon irradiation with actinic light, a crosslinking agent and a solvent, and has a maximum absorbance as a compound capable of generating an acid upon irradiation with actinic light. (Λmax) Is 300 to 450 nm, and the molar extinction coefficient (ε) is 2500. 0 or more and ε ≧ ((400 × λmax) −1 20,000) is used. |