http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002278062-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2002-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_273d8650c2c2f123e39c9e8d9c3119a6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f7dd25f28318bbb719403b5297fe6fc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e894e6a63f5bdb743ef7beddc23c5eda http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d893ea20efbe42083f3fd2ecee5638a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fffc9ab1d382ccfd1a59ccc5eb62349 |
| publicationDate | 2002-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2002278062-A |
| titleOfInvention | Positive photosensitive resin composition |
| abstract | PROBLEM TO BE SOLVED: To provide a positive photoresist composition used for ultrafine processing in the manufacture of semiconductor devices, which has a sufficiently satisfactory sensitivity, is excellent in image contrast and cross-sectional shape, and is particularly focused. Provided is a material having excellent depth width characteristics and heat resistance, and excellent in storage stability and extremely practical. SOLUTION: An alkali-soluble novolak type resin is represented by a general formula: Or (D 1 , D 2 and D 3 are represented by at least one of them being a naphthoquinone-1,2-diazidosulfonyl group, the rest being a hydrogen atom, and l, m and n are 0 or an integer of 1 to 3). To form a positive photosensitive resin composition comprising at least one compound selected from the compounds to be prepared. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111742260-A |
| priorityDate | 1992-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 89.