| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5547f741b25666fc4ae5195cf71a979b |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76807
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-469
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522 |
| filingDate |
2001-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6082b4726cd06d797f57af64685e62d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae49b91150d2bed03b16cad8330a8b07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd445f9d07f24eedd4ba1c8bf0e01f49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9da2fbdd4b9e357a66d62c77a635862 |
| publicationDate |
2002-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2002261092-A |
| titleOfInvention |
Method for manufacturing semiconductor device |
| abstract |
[PROBLEMS] To improve the interface adhesion between a low dielectric constant film and a protective film without impairing the excellent dielectric characteristics, flatness and gap fill characteristics of an organic low dielectric constant material. A resist is removed by ashing using plasma using a mixed gas containing nitrogen and hydrogen. The content of hydrogen in the mixed gas is 20% by volume. % Or less. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8283242-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004266199-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8524102-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007019486-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005045176-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100780660-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080029642-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7172965-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7189643-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010056574-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015529014-A |
| priorityDate |
2001-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |