| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_61d2a14095dbedfd47d6c443b50d3e77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06T1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-88
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-956
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01B11-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06T7-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate |
2001-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ea4529a146019a2d5c5f851f3ca007d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2ec9400b79e65ce9870b25115643149
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bdde7461c62aa9366c67b9b5caa2ce4f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b0ebe5d888fd7156f528be413bc9fa2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2119ec8dbfb2803f988e10ede188d054 |
| publicationDate |
2002-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2002257533-A |
| titleOfInvention |
Defect inspection apparatus and method |
| abstract |
PROBLEM TO BE SOLVED: To provide an object to be processed (for example, an insulating film on a semiconductor substrate) in a semiconductor manufacturing or a magnetic head manufacturing. It is an object of the present invention to provide a defect inspection apparatus and a defect inspection method capable of discriminating and inspecting scratches having various shapes generated on the surface thereof and foreign substances adhering when a polishing or grinding process such as MP is performed. . SOLUTION: The present invention performs epi-illumination and oblique illumination with substantially the same luminous flux on scratches and foreign matter generated on the surface of a polished or ground insulating film. In the method, the shallow scratch is distinguished from the foreign matter based on the correlation such as the ratio of the intensity of scattered light generated from the shallow scratch and the foreign matter. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008170222-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7912276-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8310666-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7768635-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006049078-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8437534-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8306312-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006017630-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007024737-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8660340-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7333192-B2
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101537661-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018179621-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8643834-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007292770-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009520952-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7973920-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7720275-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7952699-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007248051-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009109492-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006162500-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8218138-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007199066-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7679737-B2 |
| priorityDate |
2001-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |