| abstract |
(57) [Summary]nPROBLEM TO BE SOLVED: To provide a device having a dense silicon oxide film. Silicon oxide preferably used to manufacture devices Method for forming a film, and composition for use in the method To provide.nSOLUTION: The method of forming a silicon oxide film is non- Formula Si under oxidizing atmosphere n R m Polysilation represented by Forming a coating containing the compound, and then subjecting the coating to an oxidation treatment It is characterized by doing. Composition for use in the above method The object is of the formula Si n R m A polysilane compound represented by Contains solvent. |