http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002239921-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-28
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filingDate 2001-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50eb2c58c03d69896f475250ac364d66
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publicationDate 2002-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002239921-A
titleOfInvention Polishing film and method for producing the same
abstract PROBLEM TO BE SOLVED: To provide a polishing film capable of forming a good surface to be polished in a polishing film for precision machining of electronic parts and optical parts and for general mirror polishing, and a method of manufacturing the same. I will provide a. SOLUTION: The base film 2 and the base film 2 are provided. Polishing film 1 having polishing layer 4 formed thereon In the polishing layer 4, the binder 7 contains first abrasive particles 5 for polishing the surface to be polished as fixed abrasive particles and second abrasive particles 6 for polishing the surface to be polished as at least free abrasive particles. It becomes. At this time, the first abrasive particles 5 are inorganic solid abrasive particles having a predetermined average particle diameter in the range of 0.5 to 5 μm, and the second abrasive particles 6 have an average particle diameter of 1 to 500 nm. It is preferable that the silica particles have a predetermined average particle size in the range of
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110065010-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03101668-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5898821-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006181683-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016027671-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008260815-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106573362-A
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type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 33.