| abstract |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition having a high sensitivity in pattern formation by irradiation with actinic rays, and a radiation-sensitive composition having a higher resolution and an excellent exposure margin. Providing things. The compound contains at least one compound having at least one carbonyl group represented by the formulas (I) and (II) and decomposing upon irradiation with actinic rays with intramolecular hydrogen radical transfer to generate an acid. Radiation-sensitive composition. |