http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002236354-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2001-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92c31834d8f2cf218af417d89647356b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61eb1b5009be47cb05392bb6e31476c3 |
| publicationDate | 2002-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2002236354-A |
| titleOfInvention | Negative resist composition for electron beam or X-ray |
| abstract | PROBLEM TO BE SOLVED: To provide a chemically amplified negative type excellent in sensitivity and resolution to use of electron beam or X-ray, having a rectangular profile, and reducing roughness and the number of particles in a resist solution. A resist composition is provided. SOLUTION: This is a chemically amplified negative resist composition containing an alkali-soluble resin, an acid generator, an acid-crosslinking agent, an organic basic compound, and an organic solvent. 3 to 3 benzene ring groups It is a phenol derivative containing 10 and has a molecular weight of 2000 Hereinafter, it is a compound having at least one hydroxymethyl group and at least one alkoxymethyl group in a molecule and bonding them to at least one of benzene ring atomic groups. |
| priorityDate | 2001-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 297.