http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002229209-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2001-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92c31834d8f2cf218af417d89647356b |
publicationDate | 2002-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2002229209-A |
titleOfInvention | Negative resist composition for electron beam or X-ray |
abstract | (57) [Summary] [PROBLEMS] To solve the problem of performance improvement technology in microfabrication of a semiconductor element using an electron beam or X-ray, and to provide sensitivity, resolution, resist for use of an electron beam or X-ray. An object of the present invention is to provide a negative chemically amplified resist composition for electron beam or X-ray which satisfies the shape characteristics. The compound contains a compound having a disulfone group, which generates an acid upon irradiation with an electron beam or an X-ray, a resin which is insoluble in water and is soluble in an aqueous alkali solution, and a cross-linking agent which forms a cross-link with the resin by the action of an acid. Negative resist composition for electron beam or X-ray. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10120281-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016282720-A1 |
priorityDate | 2001-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 518.