http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002219655-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-00
filingDate 2001-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3341dbafeaee1fe6d04492dc3fb5e7fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8beab94d62d5cdcee01b6ffc4bbade6
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publicationDate 2002-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002219655-A
titleOfInvention Polishing sheet and manufacturing method thereof
abstract PROBLEM TO BE SOLVED: To provide a polishing sheet having stable polishing performance by polishing and capable of effectively reducing scratches, and a method for producing the same. SOLUTION: This polishing sheet is obtained by electrodepositing a conductive sheet and particles comprising at least one of a polymerizable compound and a polymer (polyimide resin or the like) on the surface of the conductive sheet (SUS sheet or the like). And an abrasive grain fixed on the conductive sheet by the electrodeposition layer. The electrodeposition layer is preferably obtained by heating and curing the particles after the electrodeposition. This electrodeposition layer is preferably formed using at least one of organosilane, this hydrolyzate and a partial condensate of the hydrolyzate. The present polishing sheet is manufactured by electrodepositing particles of an emulsion containing particles made of a polymerizable compound or the like and abrasive grains on the surface of a conductive sheet.
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type http://data.epo.org/linked-data/def/patent/Publication

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