| abstract |
(57) [Problem] To provide a radiation-sensitive positive resist composition which is excellent in various functions such as a focus margin (DOF) and a resolving power and is excellent in storage stability. A resin whose dissolution rate in an alkali developer is increased by the action of an acid, a compound that generates an acid by irradiation with actinic rays or radiation, a bond that is cleaved by a solvent and heat, and a radical species and / or an ionic compound A radiation-sensitive positive resist composition comprising a compound that is separated into two or more components, including: |