http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002214766-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2001-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9b865a1c7b6c4fa014e8f8ab46e0bb8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79ddd8ac60cae61fda9fc5ddc3dc4ffe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7cdae1f0b9abbcc7b3c1399b12b4d991 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1298dffa147859b80f09941451ece3f8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8deeb2f7ab8223e1bff312a75fae6282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3d6ff92c96975bd02451db704b323a3 |
| publicationDate | 2002-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2002214766-A |
| titleOfInvention | Positive-type chemically amplified photosensitive resin composition and method for producing resist image |
| abstract | (57) [Abstract] (Modified) [Problem] To develop a positive-type chemically amplified photosensitive resin composition having high sensitivity, high resolution, excellent pattern shape, and excellent process stability, and a resist pattern with good resolution. Provided is a method for producing a resist image that can be output. (A) a compound having, in a molecule thereof, an acid-decomposable group whose solubility in an aqueous alkali solution is increased by an acid-catalyzed reaction, and whose molecular weight is decreased by an acid-catalyzed reaction; A compound that generates an acid upon irradiation with actinic radiation and (c) a compound represented by the general formula (1): An ion dissociating compound represented by the general formula (2) Or a compound of the general formula (3) A coating film is formed using a positive-type chemically amplified photosensitive resin composition characterized by containing an ion dissociating compound represented by the formula and an active actinic ray on the coating film. And then developing the resist image. |
| priorityDate | 2001-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 119.