http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002214750-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_13aa7b32ae00ed83af7dfaa0b6a1f7c2 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-498 |
| filingDate | 2001-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23a5df55381e65a2d029c87c3ba8bcb4 |
| publicationDate | 2002-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2002214750-A |
| titleOfInvention | Exposure method of photothermographic material |
| abstract | (57) [Problem] To provide an exposure method for a photothermographic material in which ultra-rapid processing suitability, processing stability, halftone dot quality, and linearity are improved. SOLUTION: A photothermographic material containing organic silver particles, silver halide particles, a reducing agent and a high contrast agent on a support, A method for exposing a photothermographic material, comprising exposing with two or more light beams. The exposure wavelength of the two or more emission beams is 700 nm or more, and the average particle diameter of the silver halide particles contained in the photothermographic material is 0.02. ０．０0.06 μm, the angle between the incident light on the spinner and the reflected light when exposing with two or more emission beams is 8 The range of 8.0 to 92.0 degrees is a preferable embodiment. |
| priorityDate | 2001-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 82.