| abstract |
PROBLEM TO BE SOLVED: To provide a vaporizer for supplying a gaseous CVD raw material to a chemical vapor deposition (CVD) apparatus used for manufacturing semiconductors and the like, even when a solid CVD raw material is used. The present invention provides a vaporizer capable of obtaining a high-quality vaporized gas by efficiently vaporizing at a concentration and a flow rate of. SOLUTION: The vaporizing chamber is made of stainless steel or nickel steel, and at least a part of the vaporizing chamber side surface is a vaporizer that has been subjected to a surface roughening treatment by a blast method. |