http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002170783-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1368
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-136
filingDate 2000-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab74503e71436df693a9168b5259e72c
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publicationDate 2002-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002170783-A
titleOfInvention Plasma doping method and apparatus
abstract PROBLEM TO BE SOLVED: To provide low-cost and uniform plasma doping in a plasma doping apparatus using a helicon wave plasma source. SOLUTION: A potential is applied to a processing table 4 on which a sample 5 to be processed is mounted without using a magnetic field generated by a magnet used in combination with a coil of a helicon wave plasma source to generate a bias between the plasma and the surface of the sample 5. The plasma doping is effectively performed by controlling the plasma near the surface of the sample 5.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-100364054-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8440551-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5461404-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005005328-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010018797-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8709926-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8383496-B2
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priorityDate 2000-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 25.