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publicationDate 2002-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002168776-A
titleOfInvention Environment monitoring method and apparatus, and semiconductor manufacturing apparatus
abstract (57) [Summary] [Problem] To provide an environment monitoring method and apparatus capable of simply, quickly and at low cost detecting a contaminant present in an atmosphere, and feeding back a measurement result to environmental management, and the like. Provided is a semiconductor manufacturing apparatus provided with a simple environmental monitoring device. An infrared transmitting substrate (12) placed in a predetermined atmosphere (10), an infrared light source (20) for emitting infrared light to the infrared transmitting substrate (12), and an infrared light after multiple reflection inside the infrared transmitting substrate (12). Based on the infrared light emitted from the transmission substrate 12, Pollutant analyzing means 30 for calculating the concentration of the contaminant in the atmosphere 10, and contaminant removal for removing the contaminant in the atmosphere 10 according to the concentration of the contaminant in the atmosphere 10 calculated by the contaminant analyzing means 30. Means 50.
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