| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5547f741b25666fc4ae5195cf71a979b |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-00 |
| filingDate |
2000-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5da3071481f933abe7a521f8a033d851 |
| publicationDate |
2002-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2002162744-A |
| titleOfInvention |
Resin for resist |
| abstract |
(57) [Problem] To provide a resist resin excellent in etching resistance, resist resolution and adhesion to a substrate, and further excellent in various properties required for the resist resin. A resist resin having a molecular structure in which a protecting group is bonded to a base resin and becoming alkali-soluble by elimination of the protecting group, wherein the protecting group has the following general formula (I): ] (Wherein, Represents a condensed ring having 12 to 25 carbon atoms which may have a substituent, and R represents an alkyl group having 1 to 4 carbon atoms. A) a resin represented by the formula (1): |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017032658-A |
| priorityDate |
2000-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |