| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_805883408c251b3b421ba4bcfb2c0eb7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-128 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-08 |
| filingDate |
2001-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50834fabbebf6e15298bfe8257246509
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f170277e05262039b63866ec609c72d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6b797729caf90057f5dc016dadaa761 |
| publicationDate |
2002-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2002155089-A |
| titleOfInvention |
Preparation of alkylchlorosilane |
| abstract |
(57) Abstract: Post-treatment method for residue of direct synthesis of organochlorosilane. SOLUTION: Residue of direct synthesis of alkylchlorosilane having a boiling point of more than 70 ° C. at 1013 hPa and containing disilane. In the process for producing alkylchlorosilanes from the liquid components of the above, the residue is heated together with hydrogen chloride and silicon at a temperature of at least 300 ° C., At least 10% by weight, based on the weight of the resulting alkylchlorosilane, of tri- and / or tetrachlorosilane is formed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012111686-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101176058-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8354002-B2 |
| priorityDate |
2000-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |