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publicationDate 2002-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002148778-A
titleOfInvention Laser beam exposure equipment
abstract (57) [Problem] To provide a laser beam exposure apparatus which has a simple configuration and can suppress image unevenness due to an interference phenomenon. A laser beam emitted from a laser light source is linearly polarized by a beam splitter in a beam splitter. L2, the laser beam L2 is reflected by the mirror 3 and is made parallel to the laser beam L1. , And is converted into a circularly polarized state. Further, only the laser beam L1 passes through the λ / 2 wave plate 5 and is rotated in the reverse direction. Then, the laser beam L1 is condensed by the optical system 6 and scanned by a polygon mirror (not shown). Meanwhile, the same point on the film F as the recording medium is irradiated at a predetermined angle via the fθ optical system 7, and with this configuration, Even for the film F having birefringence, image unevenness due to the interference phenomenon can be effectively suppressed.
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