| abstract |
(57) [Abstract] [Problem] Heat resistance, acid resistance, alkali resistance, solvent resistance, Provided is a novel photopolymerizable unsaturated resin capable of forming a resist film having excellent surface hardness and the like and a method for producing the resin; photosensitivity including the resin and capable of forming a resist film having the excellent properties described above. To provide a resin composition; and to provide a color filter obtained by using the above composition and a method for producing the color filter. SOLUTION: The photopolymerizable unsaturated resin represented by the general formula (I): Here, X is a unit represented by the general formula (Ia): R 1 is a hydrogen atom or a methyl group, R 2 is a hydrogen atom or a C1-5 linear or branched alkyl group, Y is a residue of an acid anhydride, Z is a residue of an acid dianhydride, and m: n is a molar ratio of 0/100 to 100/0, and the weight-average molecular weight of the photopolymerizable unsaturated resin is 1,000 to 50, 000. |