abstract |
(57) [Problem] To provide a photosensitive composition which has little influence on a base used when forming a protective film, an interlayer insulating film and the like, and has excellent coating performance. SOLUTION: A photosensitive composition containing (A) a polyamic acid ester of the following formula [I], (B) a photopolymerization initiator, and (C) a solvent having a structure of the following general formula [II] is produced. [Formula 1] (X: a tetravalent organic group; Y: a divalent organic group; R, R ': a monovalent group containing an olefinic double bond.) |