http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002131899-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1333 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1343 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F291-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-136 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1368 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2000-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_382467da16a04499449ed13f6cf6485b |
| publicationDate | 2002-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2002131899-A |
| titleOfInvention | Negative-type photosensitive thermosetting resin composition, negative-type photosensitive thermosetting transfer material, method for forming interlayer insulating film, high aperture type liquid crystal display device, and method for manufacturing the same |
| abstract | PROBLEM TO BE SOLVED: To provide a uniform thickness, excellent insulation properties and contact hole shape accuracy, substantially colorless and transparent, and storage stability. Provided are a negative photosensitive thermosetting transfer material capable of stably forming an interlayer insulating film having excellent solvent resistance and a method for manufacturing a high aperture type liquid crystal display device. SOLUTION: In the method for manufacturing a high aperture type liquid crystal display device including an active matrix substrate having a pixel electrode, an interlayer insulating film covering a signal line and a switching device, a counter substrate, and a liquid crystal layer interposed between the two substrates, The insulating film is formed by transferring the photosensitive thermosetting resin layer of a negative photosensitive thermosetting transfer material having a photosensitive thermosetting resin layer by a laminating method. Negative-type photosensitive thermosetting resin used in the production method, containing an addition-polymerizable compound, a photopolymerization initiator, an alkali-soluble resin, a compound generating a non-volatile acid, and an acid-crosslinkable crosslinking agent. It is a negative photosensitive thermosetting transfer material containing the composition. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007041282-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102035147-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2328177-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101501041-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101430533-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101498664-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150003232-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03104899-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9104106-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005266347-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018128670-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20110005233-A |
| priorityDate | 2000-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 520.