http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002121025-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6fc8bbba7dbfdc1fe42f350fc84e17a3
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8246
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-317
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filingDate 2000-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a87bbaaa3dae91fd06c284639ed1e400
publicationDate 2002-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002121025-A
titleOfInvention Precursor solution composition for forming lanthanum bismuth titanate
abstract PROBLEM TO BE SOLVED: To provide a precursor solution composition for forming a thin film capable of forming a lanthanum bismuth titanate film exhibiting good ferroelectricity practically and inexpensively. A compound represented by the following general formulas (1) and (2) compound represented by: the NH 3-n (C 2 H 4 OH) n (1) ( wherein n is 2 or 3 NH 2 (C 2 H 4 NH) m H (2) (where m represents 2 or 3), and one or more compounds selected from the group consisting of bismuth compounds, titanium compounds, and lanthanum compounds And a precursor solution composition for forming lanthanum bismuth titanate, comprising:
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4649573-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004304193-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011142146-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004282089-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002265224-A
priorityDate 2000-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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