http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002116542-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2f8cfa5aee4410611b5c562275c9f8e3 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00 |
filingDate | 2000-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9f8061575e5390c353b43cdd92a0537 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be66881ef47caef8c44214ba1c6964c3 |
publicationDate | 2002-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2002116542-A |
titleOfInvention | Polymer compound for photoresist and resin composition for photoresist |
abstract | (57) [Problem] To provide a novel photoresist polymer compound having a good balance between adhesion to a substrate and etching resistance. SOLUTION: The following formulas (Ia) and (Ib) (Wherein, Ra represents a hydrogen atom or a methyl group, and R 1 to R 18 Represents a hydrogen atom, a methyl group or an ethyl group, respectively). The polymer compound for a photoresist contains 0.1 to 50 mol% of a monomer unit having a group containing an alicyclic hydrocarbon ring (excluding the monomer units represented by the formulas (Ia) and (Ib)). May be included. Further, it may contain 0.1 to 50 mol% of a monomer unit corresponding to a monomer having a solubility parameter value of 11 (cal / cm 3 ) 1/2 or less according to the method of Fedors. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I494329-B |
priorityDate | 2000-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 234.