http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002072502-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_40dd791eb9a6d730b2a4e8b9c8aa9b54 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 |
filingDate | 2000-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a83b9520fa44da181f9d305fe535e842 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_debf95be6a4e384f385898026aa98a62 |
publicationDate | 2002-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2002072502-A |
titleOfInvention | Method of forming patterned polysilazane film |
abstract | (57) Abstract: A method for forming a patterned polysilazane film by applying a photosensitive polysilazane composition containing polysilazane and a photoacid generator to a substrate, and developing after exposure. The decomposition time of the polysilazane in the photosensitive polysilazane composition, the removal of the development residue of the patterned polysilazane film, and the adhesion of the patterned polysilazane film to the substrate are improved. [Constitution] A photosensitive polysilazane composition containing polysilazane and a photoacid generator is applied to a substrate, and after pattern exposure, The substrate is placed on a heating plate, and in a state where the substrate is heated to, for example, 30 ° C. or higher, is brought into contact with a gas that has been humidified to have a humidity of 40% RH or higher, and then developed with an alkali developing solution. To form a patterned polysilazane film. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010016046-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7547567-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7723133-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8034545-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007312833-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008525626-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7297464-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002124460-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007023648-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4718584-B2 |
priorityDate | 2000-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 193.