http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002060690-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-25 |
filingDate | 2000-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f07e51afdf7d05bd6286bcdce8196bfd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bee50e65447e045d4dacda0c23cbbbf7 |
publicationDate | 2002-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2002060690-A |
titleOfInvention | Composition for forming film, material for forming insulating film, and silica-based film |
abstract | (57) Abstract: As a material for an interlayer insulating film in a semiconductor element or the like, a film forming composition exhibiting excellent mechanical properties, crack resistance and adhesion to SiN of a coating film and exhibiting a low dielectric constant. And a material for forming an insulating film. SOLUTION: (A) an alkoxysilane having an aryl group, (B) (B-1) a compound represented by the following general formula (2), R 3 c Si (OR 4 ) 4-c. 2) (R 3 represents a fluorine atom or a monovalent organic group, and R 4 represents 1 Represents a valent organic group, and c represents an integer of 0 to 2. (B-2) Compound represented by the following general formula (3): R 5 d (R 6 O) 3-d Si— (R 9 ) f —Si (OR 7 ) 3-e R 8 e. (3) (R 5 , R 6 , R 7 and R 8 may be the same or different and each represents a monovalent organic group; d and e may be the same or different; R 9 represents an oxygen atom or a group represented by — (CH 2 ) n —; Represents 1 to 6, and f represents 0 or 1. A) a film-forming composition comprising a hydrolyzed condensate obtained by hydrolyzing and condensing at least one compound selected from the group consisting of: |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101677289-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100103412-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002167438-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8383737-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010237667-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9170492-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010528453-A |
priorityDate | 2000-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
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