http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002043306-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522 |
| filingDate | 2000-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcf4340e8e1ff85fa9d0b70f31ac4cc2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2581d58cced1f5e873497f64fee8de24 |
| publicationDate | 2002-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2002043306-A |
| titleOfInvention | Interlayer insulating film material, semiconductor device using the same, and method of manufacturing the same |
| abstract | PROBLEM TO BE SOLVED: To provide an organic interlayer insulating film material which does not cause separation at an interface between an interlayer insulating film and a different kind of material, and to provide a high reliability manufactured using this interlayer insulating film material. Provided are a semiconductor device and a method for manufacturing the same. SOLUTION: An interlayer insulating film material is obtained by adding an allyl group and an allylic compound having both a reactive functional group different from the allyl group to an organic crosslinkable insulating film forming material as a main agent. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7615440-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011258975-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4606399-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007036296-A |
| priorityDate | 2000-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 48.