| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F265-10 |
| filingDate |
2000-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ec29c964857b9c9f1b4260af422cac0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c91bc1e77a4c9272a6578f58e9fee1a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b8c79ed4fc6125a746cfee702b51d0d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b434b787a15fc3cad0c361c3157dc56f |
| publicationDate |
2002-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2002040649-A |
| titleOfInvention |
Photosensitive resin composition and pattern forming method using the same |
| abstract |
(57) [Summary]n[PROBLEMS] Etching resistance, sensitivity, storage stability and safety Excellent and can be developed with water or alkaline aqueous solution Photosensitive composition and method of forming pattern using the same To provide.n(A) General formula 1nEmbedded imagen (Where R 1 Represents a hydrogen atom or a methyl group; Two Is carbon Shows the alkyl groups of the formulas 1 to 9. ) An alkali-soluble resin having: (b) a photopolymerizable monomer And (c) a photopolymerization initiator. Optical resin composition and method for forming pattern using the same. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009091585-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I569100-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9892839-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8802798-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8969483-B2 |
| priorityDate |
2000-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |