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publicationDate 2002-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002028441-A
titleOfInvention Gas processing method and apparatus
abstract PROBLEM TO BE SOLVED: To efficiently treat a gas to be treated such as PFC with a simple facility utilizing a chemical reaction in plasma. SOLUTION: In a chamber, a rotating electrode 18 having a cylindrical outer peripheral surface and a plate electrode 17 or another rotating electrode are arranged to face each other with a predetermined gap. The rotating electrode 18 is rotated, and both electrodes 1 A plasma 22 is generated by applying a voltage between the electrodes 7 and 18, and a gas to be processed and a reaction gas are introduced into the chamber, and these gases are drawn into the plasma 22 by using the rotation of the rotary electrode 18. By the same plasma 2 2 to cause a chemical reaction.
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