| abstract |
(57) Abstract: A lactone compound represented by the following general formula (1). Embedded image (In the formula, k is 0 or 1, and m is an integer satisfying 1 ≦ m ≦ 8.) A resist material prepared by using a polymer obtained by polymerizing a lactone compound of the present invention includes: It is sensitive to high energy rays, has excellent sensitivity, resolution, and etching resistance, and is useful for microfabrication using electron beams or far ultraviolet rays. In particular, since the absorption at the exposure wavelength of the ArF excimer laser and the KrF excimer laser is small and the adhesion to the substrate is excellent, a fine pattern that is perpendicular to the substrate can be easily formed. It is suitable as a material. |