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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C49-643
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C45-49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07B61-00
filingDate 2000-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba23b462c4356121cff670422686bc69
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publicationDate 2002-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2002020342-A
titleOfInvention Method for producing cyclopentenone compound
abstract PROBLEM TO BE SOLVED: To provide a cyclopentenone compound serving as a useful intermediate in producing a photopolymer for a photoresist used in a photolithography step of semiconductor processing. SOLUTION: An allyl compound, a norbornene compound, and carbon monoxide are reacted with a ruthenium catalyst in the presence of a base. Wherein R 1 and R 3 represent a hydrogen atom or R 1 And R 3 together represent a single bond, and R 2 and R 4 Represents, independently of each other, a hydrogen atom, a carboxyl group or a C 2-5 alkoxycarbonyl group, or R 2 And R 4 together form CO—O—CO, CHR 7 —CH R 8 —CHR 9 or CR 10 R 11 —CR 12 R 13 , R 5 represents a hydrogen atom or a C 1-4 alkyl group, n Represents an integer of 0 to 4. A method for producing a cyclopentenone compound represented by the formula:
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priorityDate 2000-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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