http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002014465-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b19eaa8e535da4e4bceed99917a68153 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 2000-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41aaa2380ad51f3afa594bacbe991bae |
| publicationDate | 2002-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2002014465-A |
| titleOfInvention | Phenol resin for excimer photoresist |
| abstract | PROBLEM TO BE SOLVED: To provide a phenol for KrF excimer photoresist which has excellent transparency to light having a wavelength of 248 nm, and which can produce a photoresist having high heat resistance, high residual film ratio, high sensitivity and high resolution. Provide resin. A phenol resin obtained by polycondensing the following (1) and (2) with an acidic catalyst, having a wavelength of 248: A phenol resin for a KrF excimer photoresist, which has a transmittance of 70 nm or more for light of nm. (1) phenols which are 40 to 100% by weight of meta-cresol, 0 to 30% by weight of para-cresol, and 0 to 30% by weight of xylenol and / or trimethylphenol; (2) Aldehydes comprising formaldehyde and a chain or cyclic aldehyde having 2 to 7 carbon atoms, wherein the weight ratio of formaldehyde to the aldehyde having 2 to 7 carbon atoms is 1 / 9-9 / 1. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8927189-B2 |
| priorityDate | 2000-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 73.