| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive resin precursor which is capable of alkali development, has a wide development margin, is excellent in exposure and resolution characteristics such as resolution and aspect ratio, and has excellent composition storage stability. And its uses. SOLUTION: A photosensitive polybenzoxazole precursor resin is produced by reacting a part of hydroxyl groups of a hydroxypolyamide of the following general formula (1) with an isocyanate compound of a general formula (2). Embedded image Embedded image |