| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45561
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45593
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-72 |
| filingDate |
1998-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2001-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2001527158-A |
| titleOfInvention |
Gas trap for CVD equipment |
| abstract |
(57) Summary Hot traps convert unreacted organometallic film precursors from the exhaust stream of a CVD process. The converted precursor forms a metal film on the surface of the hot trap, thereby protecting the hot vacuum pump surface from metal accumulation. A cold trap downstream of the hot trap freezes emissions from the exhaust stream. The metal captured in the hot trap and the output captured in the cold trap can then be recycled without being released as an emission to the environment. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018111878-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008522028-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009530083-A |
| priorityDate |
1997-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |