Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20d3042eb4ea7c9afd525aa89373349d |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-28 |
filingDate |
2000-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a550543182f4253ef41f75aa6dfdd82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1e0daac2801b7b5704e6e670fbbbdd4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd1de7afcbdb77aa35e0feb6539f2e5b |
publicationDate |
2001-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2001356495-A |
titleOfInvention |
Composition for resist stripping solution |
abstract |
(57) Abstract: A composition for a resist stripping solution comprising, as an essential component, at least one selected from the group consisting of a phosphoric ester having a perfluoroalkyl group and an amine salt and an ammonium salt thereof. [Effect] By containing a characteristic compound having a perfluoroalkyl group and a phosphoric ester group in the same molecule, it is excellent for various metal wiring materials without deteriorating resist stripping performance in a semiconductor element and liquid crystal element manufacturing process. In addition, it is possible to exhibit an anticorrosion effect. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101341754-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7879784-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006072083-A |
priorityDate |
2000-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |