| abstract |
[PROBLEMS] To provide a photosensitive material which is useful for forming a solder resist film and an insulating resin layer of various electronic components, and has excellent performance such as stability, developability, curability, and chemical resistance. Provide materials. SOLUTION: The following (A), (B), (C) and (D) A photosensitive material containing the following components: (A) an epoxy compound (a) having two or more epoxy groups in one molecule, a compound (b) having one or more polymerizable unsaturated groups and one carboxyl group in one molecule, and one compound in one molecule (C) having at least two carboxyl groups A prepolymer obtained by reacting a polybasic acid anhydride (d) with the reaction product of (b), (B) a photopolymerization initiator, (C) Reactive diluent, (D) blocked isocyanate. |