http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001316624-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522 |
| filingDate | 2000-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb2cdfdb7a2bcaed73932a50e34f222e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f68517b6f8b1f65c6423104b2f612e20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bee50e65447e045d4dacda0c23cbbbf7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f07e51afdf7d05bd6286bcdce8196bfd |
| publicationDate | 2001-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001316624-A |
| titleOfInvention | Composition for forming film and material for forming insulating film |
| abstract | (57) Abstract: As a material for an interlayer insulating film in a semiconductor device or the like, a film-forming composition exhibiting excellent mechanical properties, crack resistance, and adhesion to SiN, and exhibiting a low dielectric constant, and A material for forming an insulating film is obtained. (A) (A-1) A compound represented by the following general formula (1): R 1 a Si (OR 2 ) 4-a (1) (R 1 is a hydrogen atom, fluorine R 2 represents a monovalent organic group, a represents an integer of 0 to 2), and (A-2) a compound R represented by the following general formula (2). 3 b (R 4 O) 3 -b Si- (R 7) d -Si (oR 5) 3-c R 6 c ··· (2) (R 3, R 4, R 5 and R 6 are the same And each may represent a monovalent organic group, b and c may be the same or different, represent a number of 0 to 2, and R 7 represents an oxygen atom or — (CH 2 ) n − Represents a group represented by the formula: Represents 1 to 6, and d represents 0 or 1. A) a polymer obtained by hydrolyzing and condensing at least one compound selected from the group consisting of: (B) a film comprising an organic acid having a pKa of 2.0 to 4.2 and (C) an organic solvent; Forming composition. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006257279-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006041052-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4542927-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7402621-B2 |
| priorityDate | 2000-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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