http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001291916-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f37bc8280d9fab4985ae5b7b7fd7fc6a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L43-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L43-14 |
| filingDate | 2000-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_293407de71eb74e5b37c7520455d48ce |
| publicationDate | 2001-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001291916-A |
| titleOfInvention | Method of forming thin film for hall element |
| abstract | PROBLEM TO BE SOLVED: To provide a method for forming a thin film for a Hall element having a high hole mobility μ H and a high product sensitivity (μ H · Rs) by a simple method. SOLUTION: A step of depositing a stoichiometric composition polycrystalline thin film for a Hall element (InSb thin film) on a substrate, and a deposition substrate 1a, 1 on which the polycrystalline thin film for a Hall element is deposited. , and at least a step of locally heating the surface of b, 1c,... By moving the substrate holder 14, the local heating zone region by the local heater 11 becomes the substrate 1a, 1b, 1c,... At a constant relative speed. The size of the local heating zone region is defined by the size of the window 12 of the blind plate (shutter plate) 13. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016131565-A1 |
| priorityDate | 2000-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.