| abstract |
(57) [Abstract] (Modified) [Problem] To be transparent in the ultraviolet or shorter wavelength region, Provided is a resist composition which can utilize oxygen reactive ion etching using an additive instead of phenols. A photoresist composition containing hydroxycarborane, a polymer having an acid labile group, and a photoacid generator has been developed. [Effect] When used as an upper layer resist of two-layer thin-film imaging lithography, it shows excellent transparency to a light source having a wavelength in the extreme ultraviolet region, and exhibits excellent workability in the production of semiconductor devices. |