http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001281874-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D139-04 |
| filingDate | 2000-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_75c5e7896cd81053eae8dc081ae85e2d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23c43aa3fe55d690d955960d87a560cc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_757f8711d3b59c4a88a269e18468cfe7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa777e1a25f93c8f18382bb87c9a15d |
| publicationDate | 2001-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001281874-A |
| titleOfInvention | Composition for forming anti-reflection film for lithography and resist laminate using the same |
| abstract | (57) [Problem] To provide an excellent balance of compatibility with a general photoresist composition, and even when the application of the photoresist composition and the formation of the antireflection film are sequentially performed by one coating apparatus, the waste liquid is not removed. A composition for forming an antireflection film for lithography, which can efficiently manufacture a semiconductor element without being clogged in a waste liquid pipe, and is advantageous for saving space in a clean room, and a resist laminate using the same Offer. A composition comprising a copolymer of vinylimidazole and another water-soluble film-forming monomer and a fluorine-containing surfactant, and a coating solution obtained by dissolving the composition in water. A resist laminate obtained by forming an antireflection film on the surface of a photoresist film. |
| priorityDate | 2000-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 94.