http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001281847-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-738 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-732 |
| filingDate | 2000-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb9df332f02eed3f0dcdb9972eb7bda4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bdd0386368eaa2489f7fec1f162e0605 |
| publicationDate | 2001-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001281847-A |
| titleOfInvention | Resist composition and bisphenol derivative used therein |
| abstract | (57) Abstract: Provided is a radiation-sensitive resist composition having high resolution and high sensitivity and providing a resist pattern having excellent pattern shape and thermal characteristics, and a dissolution inhibitor used therein. SOLUTION: (A) a resin for forming a film, (B) a photoacid generator, and (C) a general formula [1] (Each symbol is as defined in the specification.) A resist composition containing a compound having a group represented by the general formula [2]: (Each symbol is as defined in the specification.) |
| priorityDate | 2000-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 120.