| abstract |
PROBLEM TO BE SOLVED: To not only be suitably used as a material for a two-layer resist method which has high sensitivity and high resolution and is particularly suitable for forming a pattern having a high aspect ratio, and has excellent heat resistance. A novel polymeric silicone compound useful as a base polymer of a chemically amplified positive resist material capable of forming a patterned pattern, a chemically amplified positive resist material containing the compound as a base polymer, and a pattern forming method. The present invention provides a compound containing one or more silicon-containing substituents selected from general formulas (1) to (3). Embedded image |