| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9ec5cad687cd89562c1e1ce4cd8cd657 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B57-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate |
2000-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95f91ecf73b91a64cb9f7608461b3ddf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d41b600c5cbe9006fec5f40a229f093
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93f839473c9ee3777303909ac1c1f57f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bdd41389fabb67875d5d03098106c8c4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4e1bb3ea7f5d2cf464fd8073806b59dc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd8de3701240ba4ee2e3eb99eaf996f7 |
| publicationDate |
2001-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2001271058-A |
| titleOfInvention |
Manufacturing method of polishing slurry |
| abstract |
(57) [PROBLEMS] To provide a polishing slurry capable of reducing scratches on a wafer surface after CMP polishing and a method for producing the polishing slurry. SOLUTION: A step of dispersing an aqueous dispersion of abrasive grains in which abrasive grains such as silica particles are dispersed in an aqueous medium with a high-pressure homogenizer, and adding a thickener to the obtained aqueous dispersion of abrasive grains. And a mixing step. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100509816-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005286047-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006352042-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005093804-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018039934-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7611552-B2 |
| priorityDate |
2000-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |