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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d089d05b5a0d1ed2e3de458c5ed54770
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publicationDate 2001-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2001259494-A
titleOfInvention Thin film formation method
abstract (57) [PROBLEMS] To form a thin film of metal sulfide or metal oxide by spraying solution particles obtained by atomizing a source material solution with an ultrasonic vibrator onto a heated film-forming substrate, Provided is a method for forming a thin film having a uniform thickness. SOLUTION: A solution supply container and an atomization container are connected so that the liquid level of the source material solution in the atomization container is kept constant, and a source supplied from the solution supply container to the atomization container. The supply rate of the material solution is measured, and the thin film is formed while controlling the output of the ultrasonic vibrator or the flow rate of the carrier gas so that the supply rate becomes an appropriate value.
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