http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001255603-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_13aa7b32ae00ed83af7dfaa0b6a1f7c2 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B26-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B27-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B26-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H04N1-113 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H04N1-23 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03D13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03B27-72 |
| filingDate | 2000-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0442f4ca78b35ffd7eb3e7f6628cdc4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c0d5779b4da188fc36ee8e8bda6cc9e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92ff9acc5d7d4e7c875a34024ff9bca9 |
| publicationDate | 2001-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001255603-A |
| titleOfInvention | Laser beam exposure apparatus, laser beam wavelength modulation method and apparatus |
| abstract | (57) [Problem] To provide a laser beam exposure apparatus in which optical adjustment is easy, loss of light amount is suppressed, and density variation due to interference unevenness does not occur. The laser beam exposure apparatus applies a laser beam from a laser light source (125, 127) to a photosensitive material (F) having at least one support layer or photosensitive layer that is transmissive or semi-transmissive for a wavelength to be used. Irradiate and expose. A beam irradiation area composed of one scanning line or a plurality of continuous scanning lines irradiated by a laser beam is defined as one linear region, and a light amount distribution ratio of a laser beam to be irradiated is changed between adjacent linear regions. . Further, a beam irradiation area surrounded by one or a plurality of pixels for irradiating a laser beam may be regarded as one pixel area, and a light amount distribution ratio of a laser beam to be irradiated between adjacent pixels may be changed. In addition, the temperature of the laser element of the laser light source that performs irradiation may be changed between the linear region and the adjacent linear region or between the pixel region and the adjacent pixel region. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006269831-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006261315-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4500715-B2 |
| priorityDate | 2000-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 55.