| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-121
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-3475
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14 |
| filingDate |
2001-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1bdd31048f672723fe1836c7a7ad5637
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b931e9bde1f556313e3f0824122c3f12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d85a50a3739912d7a23a0930df043e24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e56caeb9022417a016e75b109475f2b |
| publicationDate |
2001-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2001249457-A |
| titleOfInvention |
Cross-linkable high-resolution photoresist composition that can be used with a high base aqueous solution developer, and method of forming a photoresist pattern using the composition |
| abstract |
PROBLEM TO BE SOLVED: To provide a high resolution photoresist composition which is used in deep ultraviolet rays and can be used together with an aqueous developer having a high base strength. SOLUTION: The composition of the present invention comprises a methacrylate polymer resin having a phenol group, a crosslinking agent selected from a glycoluril derivative capable of reacting with the resin under an acid catalyst, a photoacid generator, Organic solvent. The compositions of the present invention are particularly useful in forming high resolution negative working images of less than 0.125 μm. |
| priorityDate |
2000-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |