| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2309-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B2457-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-068 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0079
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-161
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B37-1018 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 |
| filingDate |
2001-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b1b977e13d25c9b9ec16979ac679d47
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dff411db0ce74ed17ae2bdbc0bf1ca40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7792e7a26208debe494ac4e5ec72a88
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2672a9543836eb122c658cf85983fdef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7d9be0e84d41371cb99f6dacd852364
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4316c04eb898980281fdd9f55a5a484c |
| publicationDate |
2001-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2001249448-A |
| titleOfInvention |
Photoresist with increased photospeed |
| abstract |
PROBLEM TO BE SOLVED: To provide a method for increasing the photospeed of a dry film primary photoresist without changing a chemical composition. Also disclosed is a method of forming a photoresist relief image. A method of removing a protective coating from a dry film primary photoresist, contacting the dry film primary photoresist with a substrate, and vacuum laminating the dry film primary photoresist to the substrate to form a laminated structure. A method is provided for increasing the photospeed of a dry film primary photoresist, comprising: |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4686949-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003098663-A |
| priorityDate |
2000-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |