| abstract |
(57) Abstract: Provided is a radiation-sensitive resist composition having high resolution and high sensitivity, and providing a resist pattern excellent in pattern shape and etching resistance, and a polymer used therefor. (A) General formula [1] (Each symbol is as defined in the description.) A polymer having a structural unit containing a group represented by the formula (B), a resist composition containing (B) an acid generator, and a general formula [2] ] (Each symbol is as defined in the specification.) A vinyl polymer having a structural unit represented by the following formula: |