| abstract |
(57) Abstract: A phenolic novolak resin and a positive photoresist composition having high sensitivity, high resolution, and excellent depth of focus characteristics when forming minute dense and isolated patterns. SOLUTION: The peak intensity ratio of oo/op/pp bond is 3.0 to 5.0/2.0 to 3.5/1, there is no change in each molecular weight range, and A phenol novolac resin having a Mw of 3000 to 20000 having a phenolic structural unit represented by [Chemical 1] |