| abstract |
PROBLEM TO BE SOLVED: To provide an aqueous photo solder resist composition which has no problem in storage stability, has excellent heat resistance, and has no solvent odor. (A) An aqueous solution obtained by neutralizing a resin containing a radical polymerizable group and a carboxyl group with a base, (B) a photocurable mixture comprising an inorganic filler, (C) a polyfunctional acrylic monomer (c1), a compound (c2) having a cyclic ether group other than a glycidyl group, and a photopolymerization initiator (c3); Accordingly, (D) the acid value of 130 to An aqueous photo solder resist composition containing an aqueous solution obtained by neutralizing a 230 mg KOH / g radical polymer with a base, wherein the cyclic ether group other than the glycidyl group is, for example, an alicyclic epoxy group or an oxetane group. is there. |